Job Title: Systems Design Engineer
Location: Milpitas, CA
Duration: Fulltime
Job Description:
Reticle and Photomask Inspection Division (RAPID) Advanced Development team provides technology, architecture, and business solutions for next generation mask inspection. EUV mask inspection development team is developing EUV mask inspection tool. EUV source developing group is working on architecture and development of EUV source to power up next generation mask inspection tool.
Provide technical lead for technology development of cryogenic target delivery system , as well as for source subsystem design and development as needed . Will co-develop major subsystems design requirements and balance interactions while meeting overall source performance goals. Technically assess supplier's capability gaps and provide appropriate mitigation plans. Lead junior scientist and engineering resources (both internal and external) as needed for timely technology selection and subsystems development.
Education and Experience:
1.Must demonstrate excellent capability to assess cryogenic target delivery technology. Must have successful experience in high-performance cryogenic and vacuum design and development. Outstanding experimental and theoretical capabilities in the field of UHV and micro droplet generation is must.
2.Doctorate degree in relevant discipline with at least 6 years of industrial or post-doctoral experience directly related to cryogenic target delivery development.
Basic Qualification:
Doctorate (Academic) with at least 3 years of experience.
OR
Master's Level Degree with at least 6 years of experience.
Please send in your resumes to vinod.sanker@kla-tencor.com
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Posted by: Anonymous
Systems Design Engineer (EUV | Design | micro droplet | cryogenic | Ultra High Vacuum ) (#108404) Updated at :
1:00 PM
Monday, July 23, 2012
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